Study of light damage of waveguide substrates of LN and Mg:LN by holographic method

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 19 >Issue 8 >Page 566 > Article

Chinese Journal of Lasers
Vol. 19, Issue 8, 566 (1992)

Study of light damage of waveguide substrates of LN and Mg:LN by holographic method

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of light damage of waveguide substrates of LN and Mg:LN by holographic method[J]. Chinese Journal of Lasers, 1992, 19(8): 566 Copy Citation Text

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Abstract

The results of light damage in. LN and Mg: LN substrate waveguide by holographic method are reported. The waveguide were made by Ti-diffusion and proton exchange methods. The resistance to light damage of Mg:LN is stronger than that of the pure LN, and the resistance of light damage of the waveguide by proton exchange is stronger than that by Ti-diffusion.

Keywords

lithium niobate waveguide photo damage holographic method

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