• Infrared Technology
  • Vol. 42, Issue 8, 758 (2020)
Haijuan CHENG1、2、*, Weisheng YANG2, Yi CAI1, Xiaohui YU2, Rujie LI2, Ke WANG2, Jinsong ZHAO2, and Lingxue WANG1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    CHENG Haijuan, YANG Weisheng, CAI Yi, YU Xiaohui, LI Rujie, WANG Ke, ZHAO Jinsong, WANG Lingxue. High-Performance LWIR Antireflective Films Fabrication on Ge Substrate Using LaF3 as Low Refractive Index Material[J]. Infrared Technology, 2020, 42(8): 758 Copy Citation Text show less

    Abstract

    To improve the resistance of long wave infrared (LWIR) band antireflective films on Ge in harsh environments, film design and fabrication technology have been discussed using LaF3 as a low refractive index material. We fabricated high-performance multilayer antireflection (AR) coatings in an LWIR band (8–12 .m) via an optimized film structure and sectional preparation of LaF3 layer on Ge substrate. The peak transmittance was 98.3%, and the average transmittance increased from 48.4% to 96.2% when double-sided coating was used. This LWIR AR coating with LaF3 passed various environmental, durability, and mechanical properties tests while maintaining good optical properties.
    CHENG Haijuan, YANG Weisheng, CAI Yi, YU Xiaohui, LI Rujie, WANG Ke, ZHAO Jinsong, WANG Lingxue. High-Performance LWIR Antireflective Films Fabrication on Ge Substrate Using LaF3 as Low Refractive Index Material[J]. Infrared Technology, 2020, 42(8): 758
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