[1] Chen Y. Zhang H S,Zhao X G. Measurment Technique,2004,(364): 17～19
[2] Luo C Z,Sun Y,Hu X D,et al. Acta Photonic Sinica,2003,32(10): 1271～1273
[3] Xu Z,Hu X D. Luo C Z,et al. Acta Photonica Sinica,2002,31(12):1497～1500
[4] Kong Z Y,Xiong W Z,Ai H,et al. Acta Photonica Sinica,2003,32(1):30～33
[5] Luo C Z,Sun Y,Gao L M,et al. Acta Photonica Sinica,2003,32(5):628～631
[6] Ye S X. Photoelectronics displacement precise measurement technique. Chengdu: Sichuan Technology Press,2003.28～50
[7] Ma H. Precise photolithographic technics. Beijing: Weapon Industry Press,1994.155～189
[8] Xu J H,Mo W. Opto-Electronic Engineering,2003,30(4): 59～61
[9] Cao Y P,Su X Y,Liu M J,et al. Opto-Electronic Engeering,2004,31(3) : 19～21
[10] Ma H,Zhang J T. Applied technique of liquid display. Beijing: China Machine Press,2004.13～85
[11] Yu H F,Liu J. Chinese Journal of Liquid Crystals and Displays,2003,18(2): 125～129
[12] Jung-Chih Chiao,Chorum Technologies. Liquid-Crystal WDM signal processors. SPIE,2001,4532 : 54～61
