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Journals >Chinese Journal of Lasers >Volume 20 >Issue 9 >Page 663 > Article

Chinese Journal of Lasers
Vol. 20, Issue 9, 663 (1993)

A technology of plasma etched diffractive optical elements

[in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese]. A technology of plasma etched diffractive optical elements[J]. Chinese Journal of Lasers, 1993, 20(9): 663 Copy Citation Text

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Abstract

The paper investigates the technology to etch photoresist diffractive optical elements with sinuous grooves into its base layer, emphasizing upon the analysis of the relationship between both groove profiles and depthes of the base layer and the photoresist layer based on experiments.

Keywords

plasma etch profile of groove sinuous grooves diffractive optical element

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[in Chinese], [in Chinese], [in Chinese]. A technology of plasma etched diffractive optical elements[J]. Chinese Journal of Lasers, 1993, 20(9): 663

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