Optical design for EUV lithography source collector

Shuqing Zhang; Qi Wang; Dongyuan Zhu; Runshun Li; Chang Liu

doi:10.3788/COL201109.052201

Journals >Chinese Optics Letters >Volume 9 >Issue 5 >Page 052201 > Article

Chinese Optics Letters
Vol. 9, Issue 5, 052201 (2011)

Optical design for EUV lithography source collector

Shuqing Zhang¹, Qi Wang², Dongyuan Zhu¹, Runshun Li¹, and Chang Liu³

Author Affiliations

¹Research Center for Space Optical Engineering, Harbin Institute of Technology, Harbin 150080, China

²Institute of Opto-Electronics, Harbin Institute of Technology, Harbin 150080, China

³Center for Composite Material, Harbin Institute of Technology, Harbin 150080, China

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DOI: 10.3788/COL201109.052201 Cite this Article Set citation alerts

Shuqing Zhang, Qi Wang, Dongyuan Zhu, Runshun Li, Chang Liu. Optical design for EUV lithography source collector[J]. Chinese Optics Letters, 2011, 9(5): 052201 Copy Citation Text

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Shuqing Zhang, Qi Wang, Dongyuan Zhu, Runshun Li, Chang Liu. Optical design for EUV lithography source collector[J]. Chinese Optics Letters, 2011, 9(5): 052201

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