• Chinese Journal of Lasers
  • Vol. 44, Issue 3, 303002 (2017)
Fu Xiuhua1、*, Fan Jiachen1, Zhang Jing1, Xiong Shifu1, Chen Zhihang1, and Yang Yongliang2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl201744.0303002 Cite this Article Set citation alerts
    Fu Xiuhua, Fan Jiachen, Zhang Jing, Xiong Shifu, Chen Zhihang, Yang Yongliang. Development of Heat Radiation Filter Film for Ultraviolet Curing System[J]. Chinese Journal of Lasers, 2017, 44(3): 303002 Copy Citation Text show less

    Abstract

    In order to reduce the heat radiation of ultraviolet (UV) curing system, based on the optical thin-film theory, with HfO2, AlF3 and Cr as coating materials, and by use of the reflection and absorption combined structure, the filter film system with high reflection in the UV band and high absorption in visible-near infrared band is designed. The soundness of the thin film is improved by coating Al film as the transition layer between the substrate and the film system. After the optimization of process parameters, the filter film with average reflectivity of 90.6% in 220-400 nm wave band and average absorptivity of 92.4% in 420-2000 nm wave band is developed.
    Fu Xiuhua, Fan Jiachen, Zhang Jing, Xiong Shifu, Chen Zhihang, Yang Yongliang. Development of Heat Radiation Filter Film for Ultraviolet Curing System[J]. Chinese Journal of Lasers, 2017, 44(3): 303002
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