[1] DILL D H,HOMBERGER W P,HAUGE P S,et al..Characterization of positive photoresist[J].IEEE Trans.Electron Devices,1975,22(7):445-452

[2] MACK C A.30 Years of lithography simulation[J].SPIE,2004.5754(1):1-12

[3] YANG G G,SHENG Y B.Research on laser direct writing system and its lithography properties[J].SPIE,1998,3550:409-418

[4] SALGUEIRO J R,MORENO V,LINARES J.Model of linewidth for laser writing on a photoresist[J].Appl.Opt.,2002,41(5):895-901

[7] SONKA M,HLAVAC V,BOYLE R.Image Processing,Analysis,and Machine Vision[M].Posts & Telecom Press,2003:12-14

[8] DILL F H,NEUREUTHER A R,TUTTLE J A,et al..Modeling projection printing of positive photoresist[J].IEEE Trans.Electron Devices,1975,22(7):456-463