• Acta Photonica Sinica
  • Vol. 34, Issue 2, 205 (2005)
[in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less
    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Photoelectric Characteristics of SiC1-xGex/SiC Heterojunction Diode[J]. Acta Photonica Sinica, 2005, 34(2): 205 Copy Citation Text show less
    References

    [1] Chen ZhiMing, Pu Hongbing,Fred R. et al. A light-activated SiC darlington transistor using SiCGe as base layer. Chin Phys Lett, 2003,20 ( 3 ): 430 ~ 432

    [2] Katulka G, Roe K, Kolodzey J, et al. The electrical characteristics of silicon carbide alloyed with germanium.Applied Surface Science, 2001, (175-176): 505 ~511

    [3] Pankov J I. Optical Processes in Semiconductors. Englewood Clifts, Prentice-Hall, 1971.38

    [4] Solangi A M I. Absorption coefficient of a - SiC grown by chemical vapor deposition. J Mater Res, 1991,7 (3) :539 ~544

    [5] Braunstein R, Moore A R, Herman F. Intrinsic optical absorption in germanium-silicon alloys. Phys Rev, 1958,109(3): 695 ~710

    [6] Orner B A,Kolodzey J. Si1-x-yGexCy alloy band structures by linear combination of atomic orbitals. J Appl Phys, 1997,81(10): 6773 ~6780

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Photoelectric Characteristics of SiC1-xGex/SiC Heterojunction Diode[J]. Acta Photonica Sinica, 2005, 34(2): 205
    Download Citation