• Acta Photonica Sinica
  • Vol. 41, Issue 10, 1247 (2012)
FAN Xiao-juan*, LAI Zhen-quan, and LI Rui
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/gzxb20124110.1247 Cite this Article
    FAN Xiao-juan, LAI Zhen-quan, LI Rui. Influence of the Oxygen Flow on TiO2 Thin Films Prepared by DC Magnetron Sputtering[J]. Acta Photonica Sinica, 2012, 41(10): 1247 Copy Citation Text show less
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    [9] SHI Zhong-bing, TONG Hong-hui, ZHAO Jia-xue, et al. Optimized design of the magnetic field of magnetron sputtering rectangular target[J]. Vacuum and Cryogenics, 2004, 10(2): 112-116.

    [10] LANG Ming, JIANG Hong, XU Hong-wen, et al. Partial pressure of oxygen prepared by magnetron sputtering film and its photocatalytic performance[J]. Glass, 2004, 174(3): 6-9.

    [11] ZHENG S K, WANG T M, XIANG G, et a1. Photocatalytic activity of nanostructured TiO2 thin films prepared by DC magnetron sputtering method[J].Vacuum, 2001, 62(4): 361-366.

    FAN Xiao-juan, LAI Zhen-quan, LI Rui. Influence of the Oxygen Flow on TiO2 Thin Films Prepared by DC Magnetron Sputtering[J]. Acta Photonica Sinica, 2012, 41(10): 1247
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