• Infrared and Laser Engineering
  • Vol. 44, Issue 3, 867 (2015)
Zhou Jingtao1、*, Huang Jingxia2, and Li Li2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    Zhou Jingtao, Huang Jingxia, Li Li. Nd:GGG laser at 1 110 nm and frequency-doubled laser at 555 nm[J]. Infrared and Laser Engineering, 2015, 44(3): 867 Copy Citation Text show less

    Abstract

    A high-power diode-side-pumped 1 110 nm Nd:GGG laser and a laser at 555 nm based on intracavity frequency doubling of 1 110 nm laser were demonstrated for the first time. A simple straight cavity scheme was employed to achieve a compact configuration and all the coatings were designed specially. A 25.5 W 1 110 nm laser continuous wave output was achieved under the incident pump power of 168 W. A LiB3O5(LBO)crystal was used for second harmonic generation of the laser. As a result, at the pump power of 168 W, the maximum power of the frequency-doubled output at 555 nm was found to be 3.1 W with a pulse repetition rate of 10 kHz, corresponding to an optical-to-optical conversion efficiency of about 1.8%. And the pulse width of 555 nm wave was 176 ns. The M2 factors are measured to be 19.6 and 21.3 in the horizontal and vertical directions, respectively.
    Zhou Jingtao, Huang Jingxia, Li Li. Nd:GGG laser at 1 110 nm and frequency-doubled laser at 555 nm[J]. Infrared and Laser Engineering, 2015, 44(3): 867
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