Study on the Relationship between Noise Factor and Working Voltage of Microchannel Plate

Xiao-feng LI; Jin-sha LI; Le CHANG; Jiao-jiao LI; Jin-neng ZENG; Yong-xiang WU

doi:10.3788/gzxb20204907.0725002

Journals >Acta Photonica Sinica >Volume 49 >Issue 7 >Page 725002 > Article

Acta Photonica Sinica
Vol. 49, Issue 7, 725002 (2020)

Study on the Relationship between Noise Factor and Working Voltage of Microchannel Plate

Xiao-feng LI, Jin-sha LI, Le CHANG, Jiao-jiao LI, Jin-neng ZENG, and Yong-xiang WU

Author Affiliations

North Night Vision Technology Co. Ltd, Kunming 650217, China

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DOI: 10.3788/gzxb20204907.0725002 Cite this Article

Xiao-feng LI, Jin-sha LI, Le CHANG, Jiao-jiao LI, Jin-neng ZENG, Yong-xiang WU. Study on the Relationship between Noise Factor and Working Voltage of Microchannel Plate[J]. Acta Photonica Sinica, 2020, 49(7): 725002 Copy Citation Text

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References

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[5] Bao-jun YAN, Shu-lin LIU, Yue-kun HENG. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates. Nanoscale Research Letters, 10, 1-11(2015).

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[9] P GUPTA, L CULTRERA, I BAZAROV. Monte Carlo simulations of electron photoemission from cesium antimonide. Journal of Applied Physics, 121, 215702(2017).

[10] D DIMITROV, G BELL, J SMEDLEY. Modeling quantum yield, emittance, and surface roughness effects from metallic photocathodes. Journal of Applied Physics, 122, 165303(2017).

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