• Chinese Optics Letters
  • Vol. 13, Issue Suppl., S23102 (2015)
Yanyan Cui1、2, Hongji Qi1、*, Hu Wang1、2, Bin Wang1、2, Wenwen Liu1、2, Chaoyang Wei1, Jialu Guo1、2, and Kui Yi1
Author Affiliations
  • 1Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/COL201513.S23102 Cite this Article Set citation alerts
    Yanyan Cui, Hongji Qi, Hu Wang, Bin Wang, Wenwen Liu, Chaoyang Wei, Jialu Guo, Kui Yi. Fatigue effect of hafnia/silica high-reflective coatings under multiple laser pulses at 1064  nm[J]. Chinese Optics Letters, 2015, 13(Suppl.): S23102 Copy Citation Text show less
    Normalized squared e-field intensity distribution in the outer thirteen layers of the HfO2/SiO2 coatings.
    Fig. 1. Normalized squared e-field intensity distribution in the outer thirteen layers of the HfO2/SiO2 coatings.
    (a) Damage probability fitted curve under different shot numbers. (b) The variation of damage threshold of 0% and 100% probability with the shot numbers.
    Fig. 2. (a) Damage probability fitted curve under different shot numbers. (b) The variation of damage threshold of 0% and 100% probability with the shot numbers.
    (a) Average damage threshold distribution. (b) Threshold standard deviation versus the shot numbers.
    Fig. 3. (a) Average damage threshold distribution. (b) Threshold standard deviation versus the shot numbers.
    Defect density versus the shot numbers.
    Fig. 4. Defect density versus the shot numbers.
    Defect density distribution versus the intrinsic threshold with different shot numbers ranging from 1 to 1000.
    Fig. 5. Defect density distribution versus the intrinsic threshold with different shot numbers ranging from 1 to 1000.
    Yanyan Cui, Hongji Qi, Hu Wang, Bin Wang, Wenwen Liu, Chaoyang Wei, Jialu Guo, Kui Yi. Fatigue effect of hafnia/silica high-reflective coatings under multiple laser pulses at 1064  nm[J]. Chinese Optics Letters, 2015, 13(Suppl.): S23102
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