[1] H. P. Herzig. Ed., Micro: Optics Elements, Systems and Applications[M]. Taylor and Francis Ltd., 1997
[2] Jose Ramon Salgueiro, Juan Felix Roman,Vicente Moreno. System for laser writing to lithograph masks for integrated optics [J]. Opt. Eng., 1998, 37(4): 1115～1123
[3] Kanti Jain. Lithography and photoablation systems for microelectronics and optoelectronics: importance of laser beam shaping in system designs [C], SPIE, 2002, 4770: 1～12
[4] AndreiY. Smuk, Nabil M. Lawandy. Direct laser writing of diffractive optics in glass [J]. Opt. Lett.,, 1997, 22(13): 1030～1032
[5] A.G. Poleshchuk, E. G. Churin, V. P. Koronkevich et al．. Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure [J]. Appl. Opt.,1999, 38(8): 1295～1301
[9] J.Drinkwater, Z.Ryzi, C.Outwater. A new flexible origination technology based on electron beam lithography and its integration into security devices in combination with covert features based on DNA authentication [C]. SPIE, 2002, 4677: 203～214
[10] Philip Birch, Rupert Young, Maria Farsari et al.. A comparison of the iterative Fourier transform method and evolutionary algorithms for the design of diffractive optical elements [J].Optics and Lasers in Engineering ,2000, 33: 439～448
[11] Marek Skeren, Ivan Richter, Pavel Fiala. Design and optimization considerations of multi-focus phase-only diffractive elements [C]. SPIE, 2004 , 5182: 233～242
