• Optoelectronics Letters
  • Vol. 17, Issue 11, 673 (2021)
Lingmao XU, Yanchun HE, Kun LI, Hui ZHOU*, and Yuqing XIONG
Author Affiliations
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, China
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    DOI: 10.1007/s11801-021-1040-3 Cite this Article
    XU Lingmao, HE Yanchun, LI Kun, ZHOU Hui, XIONG Yuqing. Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate[J]. Optoelectronics Letters, 2021, 17(11): 673 Copy Citation Text show less
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    XU Lingmao, HE Yanchun, LI Kun, ZHOU Hui, XIONG Yuqing. Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate[J]. Optoelectronics Letters, 2021, 17(11): 673
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