• Chinese Journal of Lasers
  • Vol. 27, Issue 6, 510 (2000)
[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and Fabrication of 128×128 Diffractive Microlens Arrays on Si Substrates[J]. Chinese Journal of Lasers, 2000, 27(6): 510 Copy Citation Text show less

    Abstract

    128×128 diffractive microlens arrays have been designed by considering the relative optical and processing parameters for 3~5 μm wavelength with a microlens diameter of 100 μm. The lens F number and array pitch are f/1.5 and 100 μm, respectively. The diffractive microlens arrays have been fabricated on the surface of Si substrates by successive photolithography and Ar+ ion-beam-etching technique. The practical processes and fabrication method are discussed. The optical characteristics and measurement of the surface relief structure are presented.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and Fabrication of 128×128 Diffractive Microlens Arrays on Si Substrates[J]. Chinese Journal of Lasers, 2000, 27(6): 510
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