In order to evaluate the multilayer thickness uniformity of the optics, the measurement method based on optic figure reproducibility metrology is studied. The process of uniformity measurement and the influence factors are analyzed, and the measurement errors due to the reproducibility metrology are evaluated. The finite element analysis (FEA) model of the multilayer is built and the optic figure error due to the inner stress of the multilayer is calculated. The uniformity measurement is carried out on the high reproducibility metrology device, and the results indicate that the multilayer thickness uniformity of the optic in clear aperture is better than 0.1 nm (root mean square). When the results are transformed to thickness profile along the radial points on the optic and compared with the reflectometry test results it is shown that, the uniformity results based on reproducibility metrology are reliable. The experimental results verify the feasibility and the practicability of the measurement method of the multilayer thickness uniformity.