• Chinese Optics Letters
  • Vol. 8, Issue s1, 140 (2010)
Detlev Ristau and Henrik Ehlers
Author Affiliations
  • Laser Zentrum Hannover e.V., Department of Thin Film Technology, 30419 Hannover, Germany
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    DOI: 10.3788/COL201008s1.0140 Cite this Article Set citation alerts
    Detlev Ristau, Henrik Ehlers. High power laser components[J]. Chinese Optics Letters, 2010, 8(s1): 140 Copy Citation Text show less
    References

    [1] D. Ristau, Proc. SPIE 4099, 91 (2000).

    [2] D. Ristau, Optics and Precision Engineering (in Chinese) 13, 435 (2005).

    [3] M. A. Olmstead, N. M. Amer, S. Kohn, D. Fournier, and A. C. Boccara, Appl. Phys. A 32, 141 (1983).

    [4] E. Welsch and D. Ristau, Appl. Opt. 34, 7239 (1995).

    [5] B. Li, S. Martin, and E. Welsch, Opt. Lett. 24, 1398 (1999).

    [6] A. C. Boccora, D. Fournier, and J. Badoz. Appl. Phys. Lett. 36, 130 (1980).

    [7] D. A. Pinnow and T. C. Rich, Appl. Opt. 12, 984 (1973).

    [8] K. Starke, I. Balasa, H. Blaschke, L. Jensen, M. Jupe and D. Ristau, in Proceedings of Opt. Interfer. Coatings (OSA Technical Digest) ThA1 (2007).

    [9] D. Ristau, H. Niederwald, D. Erdelyi, P. Meja, A. Giesen, W. Pla , R. Krupka, M. Kennedy, E. Oertel, Z. Lu, T. V. Lee, K. M. Lee, H. E. Reedy, D. Scatena, N. Ellis, and D. Greening, Proc. SPIE 2714, 120 (1996).

    [10] D. Ristau, U. Willamowski, and H. Welling, Proc. SPIE 3578, 657 (1999).

    [11] ISO 11551: Optics and optical instruments. Lasers and laser related equipment. Test method for absorptance of optical laser components. International Standard. International Organisation for Standardisation, Geneva, 2003

    [12] ISO 13696: Optics and optical instruments. Lasers and laser related equipment. Test Method for Radiation Scattered by Optical Components. International Organisation for Standardisation, Geneva, 2002.

    [13] P. Kadkhoda, A. Muller, D. Ristau, A. Duparre, S. Gliech, H. Lauth, U. N. Reng, M. R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindstrom, C. G. Ribbing, and J. M. Bennett, Appl. Opt. 39, 3321 (2000).

    [14] G. Stoney, Proc. Roy. Soc. Lond. A82, 172 (1909).

    [15] B. A. Movchan and A. V. Demchishin, Phys. Met. Metalloved. 28, 83 (1969).

    [16] H .K. Pulker, W. Haag, M. Buhler, and E. Moll, in Proceedings of 5th Int. Conf. on Ion and Plasma Assisted Techniques (Munich) 299 (1985).

    [17] J. D. Targove and H. A. MacLeod, Appl. Opt. 27, 3779 (1988).

    [18] J. A. Thornton, J. Vac. Sci. Technol. 11, 666 (1974).

    [19] S. Berg and I. V. Katardjiev, J. Vac. Sci. Technol. A17, 1916 (1999).

    [20] J. B. Malherbe, S. Hofmann, and J. M. Sanz, Appl. Surf. Sci. 27, 355 (1986).

    [21] D. T. Wei and A. W. Louderback, “Method for fabricating multi-layer optical films” U. S. Patent 4142958 (1978).

    [22] D. Ristau and T. Gro , Proc. SPIE 5963, 315 (2005).

    [23] F. Sarto, E. Nichelatti, D. Flori, M. Vadrucci, A. Santoni, S. Pietrantoni, S. Gunster, D. Ristau, A. Gatto, M. Trovo, M. Danailov, and B. Diviacco, Thin Solid Films 515, 3858 (2006).

    [24] M. Bischoff, M. Sode, D. Gabler, H. Bernitzki, C. Zaczek, and N. Kaiser, Proc. SPIE 7101, 71010L (2008).

    [25] N. Beermann, H. Ehlers, and D. Ristau, in Proceedings of Opt. Interfer. Coatings (OSA Technical Digest) TuF6 (2004).

    [26] L. Jensen, M. Jupe, H. Madebach, H. Ehlers, K. Starke, D. Ristau, W. Riede, P. Allenspacher, and H. Schroeder, Proc. SPIE 6403, 64030U0 (2006).

    [27] QUEST, Quantum Engineering and Space Time Research, German Cluster of Excellence at the Leibniz University of Hannover, 2008.

    [28] D. Ristau, M. Lappschies, S. Schlichting, and H. Ehlers, Proc. SPIE 7101, 71010C (2008).

    [29] D. Ristau, in Proceedings of 10th OptiLayer-Workshop on Advanced Topics in Optical Thin Films (Hannover) 27 (2006).

    [30] D. Ristau, T. Gro , M. Lappschies, and H. Ehlers, Appl. Opt. 45, 1495 (2006).

    [31] A. Zoeller, M. Boos, H. Hagedorn, W. Klug, and C. Schmitt, in Proceedings of Opt. Interfer. Coatings on CD-ROM (OSA, Washington, DC) TuE10 (2004).

    [32] M. Hercher, J. Opt. Soc. Am. 54, 563 (1964).

    [33] K. H. Guenther, T. W. Humpherys, J. Balmer, J. R. Bettis, E. Casparis, J. Ebert, M. Eichner, A. H. Guenther, E. Kiesel, R. Kuehnel, D. Milam, W. Ryseck, S. C. Seitel, A. F. Stewart, H. Weber, H. P. Weber, G. R. Wirtenson, and R. M. Wood, Appl. Opt. 23, 3743 (1984).

    [34] ISO 11254: Optics and optical instruments. Lasers and laser related equipment. Test methods for laser induced damage threshold of optical surfaces. Part 1: 1 on 1- test, 2000, Part 2: S on 1 test, 2001, Part 3: Assurance of laser power handling capabilities, 2006, International Organization of Standardisation.

    [35] K. Starke, D. Ristau, S. Martin, A. Hertwig, J. Kruger, P. Allenspacher, W. Riede, S. Meister, C. Theiss, A. Sabbah, W. Rudolph, V. Raab, F. Grigonis, T. Rakickas, and V. Sirutkaitis, Proc. SPIE 5273, 281 (2004).

    [36] S. Papernov and A. W. Schmid, Proc. SPIE 6403, 64030D (2006).

    [37] J. Jasapara, A. V. V. Nampoothiri, W. Rudolph, D. Ristau, and K. Starke, Phys. Rev. B 63, 045117/15 (2001).

    [38] L. V. Keldysh, Soviet Physics – JETP 20, 1307 (1965).

    [39] D. Nguyen, I. Cravetchi, W. Rudolph, M. Jupe, M. Lappschies, K. Starke, and D. Ristau, Proc. SPIE 6720, 67200C (2007).

    [40] C. J. Stolz, M. D. Thomas, and A. J. Griffin, Proc. SPIE 7132, 71320C (2008).

    [41] M. Jupe, M. Lappschies, L. Jensen, K. Starke, and D. Ristau, Proc. SPIE 6403, 1A1 (2006).

    [42] M. Jupe, M. Lappschies, L. Jensen, K. Starke, and D. Ristau, Proc. SPIE 6403, 11-1 (2007).

    CLP Journals

    [1] Jie Liu, Weili Zhang, Hui Cui, Jian Sun, Hao Li, Kui Yi, Meiping Zhu. Study on high-reflective coatings of different designs at 532 nm[J]. Chinese Optics Letters, 2014, 12(8): 083101

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    [1] Xu Li, Jie Liu, Yongqiang Hou, Kai He, Weili Zhang, Kui Yi. Improvement of the laser-induced damage threshold of oxide/fluoride double stack high reflective coatings at 355nm by introducing interlayers. Applied Surface Science, 280, 772(2013).