• Optics and Precision Engineering
  • Vol. 20, Issue 11, 2380 (2012)
HAN Jian1,2,*, Bayanheshig1, LI Wen-hao1, and KONG Peng1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/ope.20122011.2380 Cite this Article
    HAN Jian, Bayanheshig, LI Wen-hao, KONG Peng. Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings[J]. Optics and Precision Engineering, 2012, 20(11): 2380 Copy Citation Text show less
    References

    [1] MENG X F, LI L F. Methods for increasing sidewall steepness of reactiveion-beam etched, sub-micrometer-period gratings[J]. Acta Optica Sinica, 2008, 28(1): 189-193. (in Chinese)

    [2] ZHAO B,QI X D. Manufacturing of high efficient holographic diffraction gratings[J]. Opt. Precision Eng., 2001,9(2):109-114.(in Chinese)

    [3] BAYANHESHIG,SHAO X X,CUI J CH, et al.. Off-axis parabolic/Lloyd mirror interferometric systems for manufacturing plane holographic gratings[J]. Opt. Precision Eng., 2011,19(1):56-63. (in Chinese)

    [4] TAN X, LI W H, BAYANHESHIG, et al.. Fabrication of ultraviolet holographic blazed graing[J]. Opt. Precision Eng., 2010,18(7):1536-1542. (in Chinese)

    [5] BAYANHESHIG,ZHANF H T, LI W H. Mathematic model and experiment verification of spin coating on concave spherical substrate[J]. Opt. Precision Eng., 2008, 16(2):229-234. (in Chinese)

    [6] DILL F H, HORNBERGER W P, HAUGE P S, et al.. Characterization of positive photoresist[J]. IEEE. Trans. Electrom Devices, 1975, 22(7): 445-452.

    [7] MACK C A. Development of positive photoresist[J]. Electrochem.Soc., 1987, 134:148-152.

    [8] MELLO B A, COSTA I F, LIMA C R A, et al.. Developed profile of holographically exposed photoresist gratings[J], Appl. Opt., 1995, 34(4): 597-603.

    [9] ZANKE C, GOMBERT A, ERDMANN A, et al.. Fine-tuned profile simulation of holographically exposed photoresist gratings[J]. Opt. Comm., 1998, 154(1): 109-118.

    [10] BRITTEN J A, BOYD R D, SHORE B W. In-situ end-point detection during development of submicrometer grating structures in photoresist[J]. Opt. Eng., 1995, 34(2):474-479.

    [11] ZHAO J S, LI L F, WU ZH H. Modeling of In-Situ Monitoring curves during development of holographic gratings[J]. Acta Optica Sinica, 2004, 24(8): 1146-1150. (in Chinese)

    [12] ZHAO J S, LI L F, WU ZH H. In-situ self-monitoring of latent image in fabrication of holographic gratings[J]. Acta Optica Sinica, 2004, 24(6): 851-858. (in Chinese)

    [13] KONG P, BAYANHESHIG, LI W H, et al.. Modeling and in-situ monitoring of the asymmetric exposure and development of holographic grating[J]. Acta Optica Sinica, 2010, 30(1): 65-69. (in Chinese)

    [14] ZHAO J S, LI L F, WU ZH H. Method for controlling groove depth and duty cycle of rectangular photoresist gratings[J]. Acta Optica Sinica, 2004, 24(9): 1285-1291. (in Chinese)

    [15] LIU Q, WAN H, WU J H. Research on acquisition of low gradient photoresist gratings[J]. Acta Photonica Sinica,2008,37(7):1401-1405. (in Chinese)

    [16] CHEN G, WU J H, LIU Q. Study on the profile evolution of the photoresist grating mask and its law[J]. Optical Technique, 2008,34(1):133-140. (in Chinese)

    [17] MONTOYA J C, CHIH H CH, HEILMANN P K, et al.. Doppler writing and linewidth control for scanning beam interference lithography[J]. J.Vac.Sci.Technol.B, 2005, 23(6), 2640-2645.

    [18] ARTHUR T, HO W K, KIEW C M, et al.. Real-time control of photoresist development process[J]. SPIE, 2005, 5755: 244-250.

    CLP Journals

    [1] Jiang Shan, Bayanheshig, Song Ying, Pan Mingzhong, Li Wenhao. Effect of Measured Interference Fringe Period Error on Groove Profile of Grating Masks in Scanning Beam Interference Lithography System[J]. Acta Optica Sinica, 2014, 34(4): 405003

    HAN Jian, Bayanheshig, LI Wen-hao, KONG Peng. Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings[J]. Optics and Precision Engineering, 2012, 20(11): 2380
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