Symmetrical periods used as matching layers in multilayer thin film design

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Optics Letters >Volume 4 >Issue 11 >Page 675 > Article

Chinese Optics Letters
Vol. 4, Issue 11, 675 (2006)

Symmetrical periods used as matching layers in multilayer thin film design

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], "Symmetrical periods used as matching layers in multilayer thin film design," Chin.Opt.Lett. 4, 675 (2006) Copy Citation Text

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Abstract

Properties of symmetrical layers as matching layers in multilayer thin film design were analyzed. A calculation method was presented to derive parameters of desired equivalent refractive index. A harmonic beam splitter was designed and fabricated to test this matching method.

Keywords

220.0220 310.6860 230.1360

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], "Symmetrical periods used as matching layers in multilayer thin film design," Chin.Opt.Lett. 4, 675 (2006)

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