Application of laser etching technology

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Infrared and Laser Engineering >Volume 33 >Issue 5 >Page 469 > Article

Infrared and Laser Engineering
Vol. 33, Issue 5, 469 (2004)

Application of laser etching technology

[in Chinese]^1、*, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Application of laser etching technology[J]. Infrared and Laser Engineering, 2004, 33(5): 469 Copy Citation Text

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Abstract

The gasifying phenomenon in laser etching is analyzed with the theory of heat conduction. According to different materials, appropriate working condition is selected, experiments of engraving, broaching and marking by using high-power laser are operated, and the etching results are compared. The results show that the method is consistent with the theory analysis and can be applied in many fields.

Keywords

Laser etching Laser marking Optical slots Silicon wafer

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Application of laser etching technology[J]. Infrared and Laser Engineering, 2004, 33(5): 469

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