[6] D. Ochs, J. Schroeder, B. Cord et al.. Glass substrate cleaning using a low energy ion source [J]. Surface Coatings Technology, 2001, 142-144:767～770

[7] Harold R. Kaufman, Raymond S. Robinson, Richard Ian Seddon. End-Hall ion source [J]. J. Vac. Sci. Technol. A, 1987, 5(4):2081～2084

[9] Luke Hanley, Susan B. Sinnott. The growth and modification of materials via ion Csurface processing [J]. Surface Science, 2002, 500:500～522

[11] G. Rasigni, F. Varnier, J. P. Palmari et al.. Study of surface roughness for thin films of CaF2 deposition on glass substrates [J]. Opt. Commun., 1983, 46(5-6):294～299

[13] S. Mohan, M. Ghanashyam Krishna. A review of ion beam assisted deposition of optical thin films [J]. Vacuum, 1995, 46(7):645～659