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Journals >Acta Photonica Sinica >Volume 34 >Issue 1 >Page 25 > Article

Acta Photonica Sinica
Vol. 34, Issue 1, 25 (2005)

Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating[J]. Acta Photonica Sinica, 2005, 34(1): 25 Copy Citation Text

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References

[1] Ettenberg M.A new dielectric facet reflector for semicoductor lasers.Appl Phys Lett,1978,32(11):724～725

[2] Giulio M D,Alvisi M,Perrone M R,et al.Laser damage testing of SiO2 and HfO2 thin films.SPIE,1999,3738: 337～346

CLP Journals

[1] LI Zai-jin, HU Li-ming, WANG Ye, YANG Ye, PENG Hang-yu, ZHANG Jin-long, QIN Li, LIU Yun, WANG Li-jun. Facet coating for 808 nm Al-containing semiconductor laser diodes[J]. Optics and Precision Engineering, 2010, 18(6): 1258

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating[J]. Acta Photonica Sinica, 2005, 34(1): 25

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