• Acta Photonica Sinica
  • Vol. 34, Issue 1, 25 (2005)
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  • [in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating[J]. Acta Photonica Sinica, 2005, 34(1): 25 Copy Citation Text show less
    References

    [1] Ettenberg M.A new dielectric facet reflector for semicoductor lasers.Appl Phys Lett,1978,32(11):724~725

    [2] Giulio M D,Alvisi M,Perrone M R,et al.Laser damage testing of SiO2 and HfO2 thin films.SPIE,1999,3738: 337~346

    CLP Journals

    [1] LI Zai-jin, HU Li-ming, WANG Ye, YANG Ye, PENG Hang-yu, ZHANG Jin-long, QIN Li, LIU Yun, WANG Li-jun. Facet coating for 808 nm Al-containing semiconductor laser diodes[J]. Optics and Precision Engineering, 2010, 18(6): 1258

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of 808 nm SQW Semiconductor Laser Facet AR HR Coating[J]. Acta Photonica Sinica, 2005, 34(1): 25
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