• Chinese Journal of Lasers
  • Vol. 29, Issue s1, 185 (2002)
CHEN Gang, PAN Bai-liang, and YAO Zhi-xin
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  • [in Chinese]
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    CHEN Gang, PAN Bai-liang, YAO Zhi-xin. Study of the Dynamic Plasma Resistance in CuBr Laser with Hydrogen Additive[J]. Chinese Journal of Lasers, 2002, 29(s1): 185 Copy Citation Text show less

    Abstract

    The electro-optics pulse waveforms and dynamic plasma resistances are measured and ccmpared with and without hydrogai additive. It is found that the peak of the discharge voltage increased about 34% and the amplitude of pulse current reduced approximately 23%, meanwhile the dynamic plasma resistance increased about 2 times with 2% hydrogen additive in Ne buffer gas. The reason for this phenomena and mechanism with hydrogen additive are discussed and presented.
    CHEN Gang, PAN Bai-liang, YAO Zhi-xin. Study of the Dynamic Plasma Resistance in CuBr Laser with Hydrogen Additive[J]. Chinese Journal of Lasers, 2002, 29(s1): 185
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