Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold

Huang-Yu Lin; Chin-Wei Sher; Dan-Hua Hsieh; Xin-Yin Chen; Huang-Ming Philip Chen; Teng-Ming Chen; Kei-May Lau; Chyong-Hua Chen; Chien-Chung Lin; Hao-Chung Kuo

doi:10.1364/PRJ.5.000411

Journals >Photonics Research >Volume 5 >Issue 5 >Page 411 > Article

Photonics Research
Vol. 5, Issue 5, 411 (2017)

Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold

Huang-Yu Lin¹, Chin-Wei Sher¹, Dan-Hua Hsieh¹, Xin-Yin Chen¹..., Huang-Ming Philip Chen¹, Teng-Ming Chen², Kei-May Lau³, Chyong-Hua Chen¹, Chien-Chung Lin⁴ and Hao-Chung Kuo^1,*|Show fewer author(s)

Author Affiliations

¹Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 30010, China

²Department of Applied Chemistry, National Chiao Tung University, Hsinchu 30010, China

³Department of Electric and Computer Engineering, Hong Kong University of Science and Technology, Kowloon 999077, Hong Kong ASR, China

⁴Institute of Photonic System, National Chiao Tung University, Tainan 711, China

show less

DOI: 10.1364/PRJ.5.000411 Cite this Article Set citation alerts

Huang-Yu Lin, Chin-Wei Sher, Dan-Hua Hsieh, Xin-Yin Chen, Huang-Ming Philip Chen, Teng-Ming Chen, Kei-May Lau, Chyong-Hua Chen, Chien-Chung Lin, Hao-Chung Kuo, "Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold," Photonics Res. 5, 411 (2017) Copy Citation Text

EndNote(RIS)

BibTex

Plain Text

show less

Cited By

Article index updated: May. 17, 2025

Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.