• Chinese Journal of Lasers
  • Vol. 31, Issue 1, 45 (2004)
[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Manufacturing System for Gray-scale Masks Based on the Spatial Light Modulator[J]. Chinese Journal of Lasers, 2004, 31(1): 45 Copy Citation Text show less
    References

    [1] J. S. Thomas, C. O. Donald. Gray-scale masks for diffractive-optics fabrication: Ⅰ. Commercial slide imagers [J]. Appl. Opt., 1995, 34(32):7507~7517

    [2] V. P. Korolkov, A. I. Malyshev, V. G. Nikitin et al.. Application of gray-scale LDW-glass masks for fabrication of high-efficiency DOEs [C]. SPIE, 1999, 3633:129~138

    [5] R. W. Michael, Heng Su. Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication [J]. Appl. Opt., 1998, 37(32):7568~7576

    [6] K. Reimer, H. J. Quenzer, M. Jürss et al.. Micro-optic fabrication using one-level gray-tone lithography [C]. SPIE, 1997, 3008:279~288

    [7] C. O. Donald, S. R. Willie. Gray-scale masks for diffractive-optics fabrication: Ⅱ. Spatially filtered halftone screens [J]. Appl. Opt., 1995, 34(32):7518~7526

    CLP Journals

    [1] Guo Xiaowei, Du Jinglei, Liu Yongzhi. Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography[J]. Acta Optica Sinica, 2009, 29(3): 794

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Manufacturing System for Gray-scale Masks Based on the Spatial Light Modulator[J]. Chinese Journal of Lasers, 2004, 31(1): 45
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