Journals >Optoelectronic Technology
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2022
Volume: 42 Issue 1
14 Article(s)
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Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 6 (2022)
Invited Paper
Future Display Technologies Driven by Visual Perception Needs and Low Carbon Strategies
Yuning ZHANG, and Baoping WANG
The development history of display technology was briefly reviewed， and the development trend of display technology was discussed under the guidance of visual perception requirements and carbon peaking and carbon neutrality goals.Both the improvement and optimization of existing display technology， and the innovation aThe development history of display technology was briefly reviewed， and the development trend of display technology was discussed under the guidance of visual perception requirements and carbon peaking and carbon neutrality goals.Both the improvement and optimization of existing display technology， and the innovation and development direction of new display technology in the future were referred to..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 1 (2022)
Research and Trial-Manufacture
Biosensor with Tunable Hyperbolic Metamaterial Based on Brewster Mode
Shichao WANG, Tun CAO, Zilan WANG, and Jingyuan JIA
A tunable HMM biosensor with the excitation of Brewster modes from free-space was proposed. The multi-layered HMM took VO2 as dielectric medium and GH shift was calculated using the transfer matrix method. The calculated refractive index sensitivity of this proposed biosensor could reach a maximum of 6.75 ×106 nm A tunable HMM biosensor with the excitation of Brewster modes from free-space was proposed. The multi-layered HMM took ![]()
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Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 8 (2022)
A Single⁃image Three⁃dimensional Face Reconstruction Method Based on Face Information Completion
Jiafu GUO, and Limin YAN
The main direction of 3D face reconstruction lies in the accurate reconstruction of the surface shape， and insufficient attention has been paid to the effect of the side face reconstruction with missing part of the face information. To solve this problem， a single-image 3D face reconstruction method was proposed based The main direction of 3D face reconstruction lies in the accurate reconstruction of the surface shape， and insufficient attention has been paid to the effect of the side face reconstruction with missing part of the face information. To solve this problem， a single-image 3D face reconstruction method was proposed based on face information completion. Firstly， the frontal face image was used to generate a three-dimensional face model， which was used to obtain a side face image， then this set of corresponding pictures was used to train the network， so that a single side face image was reconstructed finally with three-dimensional face model with complete face information. Experimental results prove that this proposed method is stable and reliable， and the generated 3D face model has the advantages of high precision and complete texture..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 15 (2022)
Research and Improvement Analysis on the Defects of Photomask Diffraction Mura
Wen LI, Bing XU, Qilong XIONG, and Zhijun XU
Lithography process is the most important part of mask manufacturing processes. Diffraction mura， as a common defect in lithography process， seriously affects the quality of customer products. Based on the generation mechanism of diffraction mura， the improvement measures are put forward from the aspects of graphic desLithography process is the most important part of mask manufacturing processes. Diffraction mura， as a common defect in lithography process， seriously affects the quality of customer products. Based on the generation mechanism of diffraction mura， the improvement measures are put forward from the aspects of graphic design and chamber environment. Different overlap ratio of overlap and graphics， different overlap position types， chamber temperature and relative humidity fluctuations are set to observe the variation of diffraction mura. The results show that the severity of diffraction nura increases with the increase of overlap ratio； Compared with mixed overlap position type， Single overlap position type performs better on diffraction mura； When the chamber temperature fluctuates more than 0.01 ℃ and the relative humidity fluctuates more than 32%， the fluctuation of focused air flow exceeds the standard， and the diffraction mura becomes more serious. By controlling the temperature and humidity of graphic design and lithography， the occurrence of diffraction mura can be reduced to a certain extent， which can also be used for reference for the improvement of other stripes..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 22 (2022)
Design and Experiment on Low Level Charge to Voltage Factor Structure of CCD
Xiaodong WANG, Chaomin WANG, Jia LI, Ge TU, and Jin LI
Larger size output node and bigger gate capacitor of amplifier were designed to ensure the total capacitor reach the level of 4.5×10-13 F and the experiment process of new design configuration was carried out. It was verified that after optimization of the design， the Charge to Voltage Factor of the ultraviolet liLarger size output node and bigger gate capacitor of amplifier were designed to ensure the total capacitor reach the level of 4.5×10-13 F and the experiment process of new design configuration was carried out. It was verified that after optimization of the design， the Charge to Voltage Factor of the ultraviolet linear CCD could accurately achieve 0.352 μV/e- based on the development of parameter calibration， structure optimization， process testing， parameter examination and certifying. The results could finally meet the special needs of the space flight system on the basis of the improved CCD’s performance parameters， such as high level full-well capacity up to 1.0×107 e-/pixel， 3.5~4 V output voltage and 0.35 μV/e- low level Charge to Voltage Factor with one or two order of magnitude smaller than traditional CCD..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 28 (2022)
Adaptive Elimination of Low Frequency Noise in Remote Optical Fiber Hydrophone System
Qiuwen ZHONG, Zhuang CHENG, Zhengming QIAO, Zhifa CHEN, Wenjie XIA, Xiang ZHAO, and Yi ZHU
The adaptive recursive least square （RLS） method was introduced for the first time to suppress the low-frequency （0 ~ 500 Hz） background noise of 100 km transmission optical fiber hydrophone system， and compared with the direct subtraction （DS）. The results showed that DS had poor basic noise suppression effect for fibThe adaptive recursive least square （RLS） method was introduced for the first time to suppress the low-frequency （0 ~ 500 Hz） background noise of 100 km transmission optical fiber hydrophone system， and compared with the direct subtraction （DS）. The results showed that DS had poor basic noise suppression effect for fiber-optic hydrophone system， and RLS adaptive algorithm had obvious noise suppression effect： 16 dB@40 Hz， 20 dB@100 Hz， 15 dB@200 Hz ， 18 dB@300 Hz and 13 dB @400 Hz. After RLS adaptive noise suppression， the noise level of the system above 350 Hz was stable at -95 dB， which was equivalent to that of the high frequency part. RLS adaptive cancellation could suppress the noise and retain the useful signal in the sensor probe..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 32 (2022)
A Temperature Feedback PWM Circuit Design for Silicon‑based OLED Driving Chip
Wei QIU, Changbing QIN, Huicheng ZHU, Tingting XU, and Baixue ZHANG
A temperature feedback PWM adjustment circuit has been proposed. The circuit could automatically pulse width modulate the common cathode voltage according to temperature changes， so as to maintain the brightness and gray-scale characteristics of the OLED screen with the temperature changing. The circuit used 0.18 μm 1PA temperature feedback PWM adjustment circuit has been proposed. The circuit could automatically pulse width modulate the common cathode voltage according to temperature changes， so as to maintain the brightness and gray-scale characteristics of the OLED screen with the temperature changing. The circuit used 0.18 μm 1P6M mixed-signal technology to complete the circuit design and tape-out verification. Simulation and test results showed that when the temperature changed from -45 °C to 70 °C， the screen brightness and grayscale characteristics remained unchanged. In the end， the problem about the brightness of the OLED screen changing with temperature， and the traditional solution changing the gray-scale characteristics were solved..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 36 (2022)
Terahertz Metamaterial Filter Based on Dielectric Resonator
Na ZHANG, and Zifan MENG
A terahertz metamaterial filter based on dielectric resonator was proposed. Its structure consisted of a high dielectric constant resonator and a polydimethylsiloxane （PDMS） substrate， and its simulation analysis was carried out by finite element method. The results showed that the filter was insensitive to polarizatioA terahertz metamaterial filter based on dielectric resonator was proposed. Its structure consisted of a high dielectric constant resonator and a polydimethylsiloxane （PDMS） substrate， and its simulation analysis was carried out by finite element method. The results showed that the filter was insensitive to polarization. The filtering characteristics were explored and the influence of structure parameters on transmission coefficient was studied by using the control variable method. At the same time， part or all of the frequency band could be dynamically adjustable by controlling the change of the dielectric constant of the liquid crystal. In addition， in order to understand the transmission mechanism of the filter， the resonant mechanism was analyzed from two aspects： the effective medium theory and the resonator theory..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 41 (2022)
Analysis and Improvement of Stripe Mura in TFT‑LCD
Zhenglin ZHANG, Shuhui CAO, Yan WANG, Chen LYU, and Zhenyu FENG
Aiming at a kind of stripe Mura problem in the production process of A type， and through the study of defective products and the statistical analysis of the data， it was found that the black matrix layer （BM） pattern in Mura abnormal area had an undercut problem. Because of the accumulation of static electricity in theAiming at a kind of stripe Mura problem in the production process of A type， and through the study of defective products and the statistical analysis of the data， it was found that the black matrix layer （BM） pattern in Mura abnormal area had an undercut problem. Because of the accumulation of static electricity in the contact part between the developing machine guide wheel and the glass， the contact angle between BM light resistance and glass became smaller due to the electrostatic interference， and then melt flow occurred in the BM uncured layer in the back exposure process after developing， causing the BM undercut edge after curing process. It was found that the degree of stripe Mura could be effectively improved by optimizing the back exposure process parameters and turning off the exposure lamp. Besides， the Parallel arrangement of the guide wheel was changed into Zigzag arrangement， which could furtherly improve the bad phenomenon of stripe Mura. The incidence of stripe Mura decreased from 0.8% to 0， so the improving effect was remarkable..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 47 (2022)
Design of Self⁃calibration Water Level Measuring Instrument for Deep Foundation Pit
Lin CHEN, Liheng WANG, and Zuohao ZHANG
An automatic calibrated deep foundation pit water level measuring instrument was designed， which was composed of a controller， a laser sensor， a controllable lifting motor， an alloy design board， etc. The controller controlled the lifting of the master-slave motor to form an angle difference. The laser sensor was in a An automatic calibrated deep foundation pit water level measuring instrument was designed， which was composed of a controller， a laser sensor， a controllable lifting motor， an alloy design board， etc. The controller controlled the lifting of the master-slave motor to form an angle difference. The laser sensor was in a certain dimension. The inner surface of the deep foundation pit was scanned to obtain the measurement data， and then the relevant model was established to calculate the angle between the sensor and the water level. The controller controlled the laser sensor to be perpendicular to the water level to realize the self-calibration function. This design had overcome the drift of measuring points caused by some external factors such as vibration and body offset， so as to achieve the purpose of accurate measurement..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 53 (2022)
Cutting Wave Defect Improvement with the Scribing Procedure
Feigao WU, Qinqi LIU, Hairong WANG, Fuqing LIU, Ciguang LUO, and Minghui LIU
By testing different DOE conditions of cutting process， and based on the characteristics of automatic cutting machine， the same cutter process with high repeated accuracy and the auxiliary cutting process with the same wheel were used.By testing different DOE conditions of cutting process， and based on the characteristics of automatic cutting machine， the same cutter process with high repeated accuracy and the auxiliary cutting process with the same wheel were used..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 57 (2022)
Study Report
Development and Application of Micromation LED Display Technologies
Deyu SONG, Yinglu FANG, Lu WANG, Hongbao YANG, Xiaojian LI, and Weihua FAN
Characteristics and typical applications of micromation LED display technologies were introduced， with analysis of the key technologies and solutions related to micromation LED display. Domestic and international research progress of micromation LED display on technical grounds， as well as prospects were summarized. EsCharacteristics and typical applications of micromation LED display technologies were introduced， with analysis of the key technologies and solutions related to micromation LED display. Domestic and international research progress of micromation LED display on technical grounds， as well as prospects were summarized. Especially in military fields， it was supposed to aiming at achieving practicality and reliability of Micro‑LED display， making emphasis on circuit control technology development， heat dissipation capability optimization， and special technical problem solutions， such as NVIS and EMC..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 64 (2022)
Study on the Digital Low⁃light Level Night Vision Device Technology
Hao WU, Yuan WU, Wei WU, and Shengjiang FANG
The development process of the digital low⁃light level （LLL） night vision technology was reviewed， and the detection mechanism and imaging characteristics of some mainstream LLL detection products based on digital image processing technology were expounded. The advantages and disadvantages of various detectors in diffeThe development process of the digital low⁃light level （LLL） night vision technology was reviewed， and the detection mechanism and imaging characteristics of some mainstream LLL detection products based on digital image processing technology were expounded. The advantages and disadvantages of various detectors in different applications were introduced and compared. At the same time， the future development direction and application prospects of digital LLL detection technology were analyzed..
Optoelectronic Technology
- Publication Date: Mar. 28, 2022
- Vol. 42, Issue 1, 72 (2022)
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