• Chinese Optics Letters
  • Vol. 2, Issue 4, 04187 (2004)
Xianzhong Chen*, Hanmin Yao, and Xunan Chen
Author Affiliations
  • State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209
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    Xianzhong Chen, Hanmin Yao, Xunan Chen. Classical simulation of atomic beam focusing and deposition for atom lithography[J]. Chinese Optics Letters, 2004, 2(4): 04187 Copy Citation Text show less

    Abstract

    We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
    Xianzhong Chen, Hanmin Yao, Xunan Chen. Classical simulation of atomic beam focusing and deposition for atom lithography[J]. Chinese Optics Letters, 2004, 2(4): 04187
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