• Acta Photonica Sinica
  • Vol. 44, Issue 5, 531003 (2015)
XU Kai*, LU Yuan, LING Yong-shun, and QIAO Ya
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/gzxb20154405.0531003 Cite this Article
    XU Kai, LU Yuan, LING Yong-shun, QIAO Ya. Finite Element Analysis of Temperature Rising in VO2 Thin Films Under Irradiation of CO2 Pulse Laser[J]. Acta Photonica Sinica, 2015, 44(5): 531003 Copy Citation Text show less

    Abstract

    In order to know the influence of parameter of pulse laser on the temperature filed in the researches of protection to high power pulse laser, the change of temperature filed of the films was analyzed by thermal analysis module of ANSYS. The influence of laser facula radius, power density, pulse width and repetition frequency on the time and area size of the VO2 thin films phase transition was analyzed in the module. The results of analysis show that, the four parameters effect the transition reaching time of thin films together. The time can be shortened by amplifying laser facula radius and power density, but the proportion of area radius to laser facula radius can’t be effected directly. Amplifying pulse width or repetition frequency can shorten the transition reaching time, while the former is better to amplifying the heat production by one pulse than the latter.
    XU Kai, LU Yuan, LING Yong-shun, QIAO Ya. Finite Element Analysis of Temperature Rising in VO2 Thin Films Under Irradiation of CO2 Pulse Laser[J]. Acta Photonica Sinica, 2015, 44(5): 531003
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