In order to fabricate the large-angle (more than 50°) diffractive optical elements with low cost and mass preparation, a fabrication method base on nanoimprint lithography was proposed. A diffractive optical elements master mold was prepared via conventional photolithography or electron beam lithography. The mold was then imprinted onto the nanoimprint resist with quartz substrate. The structure was transferred to the resist and the diffractive optical elements were achieved. In contrast to other techniques, the nanoimprint mold can be repeatedly used to lower production cost and improve the efficiency. Based on the method, diffractive optical elements with different feature sizes (minimum 250 nm, diffractive angle 70°) were fabricated for different diffractive patterns，which has a good diffractive efficiency, realizing high-fidelity replication of relief structure with high aspect ratio. The technology can fabricate diffraction optical elements from micron to nanometer scale with high fidelity, low cost and mass production.