• Chinese Optics Letters
  • Vol. 10, Issue s2, S23101 (2012)
Jinqiu Liu, Changlong Cai, and Haifeng Liang
DOI: 10.3788/col201210.s23101 Cite this Article Set citation alerts
Jinqiu Liu, Changlong Cai, Haifeng Liang. Temperature coef f icient of resistance of reduced graphene oxide[J]. Chinese Optics Letters, 2012, 10(s2): S23101 Copy Citation Text show less

Abstract

The influence of technique parameters on the temperature coefficient of resistance (TCR) of reduced graphene oxide (RGO) films is studied. These technique parameters include the ultrasonic time, solution concentration, and heat treatment temperature. Results show that, the best technique parameters are ultrasonic time of 14 h, solution of 0.12 ml, and annealing temperature of 800 oC, and on this point, TCR value of RGO is from -0.67% to -1.36% at the different film thicknesses.
Jinqiu Liu, Changlong Cai, Haifeng Liang. Temperature coef f icient of resistance of reduced graphene oxide[J]. Chinese Optics Letters, 2012, 10(s2): S23101
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