Uniform Design Method of the Exposure Time of X-ray Picoseconds Framing Camera with Gated Microchannel Plate

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Photonica Sinica >Volume 37 >Issue 3 >Page 439 > Article

Acta Photonica Sinica
Vol. 37, Issue 3, 439 (2008)

Uniform Design Method of the Exposure Time of X-ray Picoseconds Framing Camera with Gated Microchannel Plate

[in Chinese]¹, [in Chinese]^1、2, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, and [in Chinese]¹

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Uniform Design Method of the Exposure Time of X-ray Picoseconds Framing Camera with Gated Microchannel Plate[J]. Acta Photonica Sinica, 2008, 37(3): 439 Copy Citation Text

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