• Chinese Optics Letters
  • Vol. 5, Issue 10, 602 (2007)
Min Zhao*, Zhanshan Wang, Yan Ma, Bin Ma, and Fosheng Li
Author Affiliations
  • Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
  • show less
    DOI: Cite this Article Set citation alerts
    Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li. Quantum simulation for peak broadening in atom lithography[J]. Chinese Optics Letters, 2007, 5(10): 602 Copy Citation Text show less

    Abstract

    A grating structure with period of half of the laser wavelength generated by focusing Cr atoms with nearly resonant laser standing wave atom lens was simulated using a quantum-mechanical model. The influence of thermal atomic source on atom focusing, including the statistical distribution of the longitudinal velocity and the beam divergence, was discussed. The background and full-width at half-maximum (FWHM) of atomic density peaks with vz in Maxwell distribution and vx0 in Gaussian distribution increase significantly compared with ideal atoms. Collimating atoms with laser cooling is necessary to decrease the peak broadening.
    Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li. Quantum simulation for peak broadening in atom lithography[J]. Chinese Optics Letters, 2007, 5(10): 602
    Download Citation