In order to meet different centering measurement demands when edging and assembling the projection lens, a centering system by using collimation and interference with two channels is proposed. The system use collimation and interference in the same optical configuration. Parameters of the measurement system are designed, and measurement range, sensitivity and the measurement accuracy are analyzed in theory. The results show that measurement range of the system by using collimation is from 1 μm to 500 μ m, the highest sensitivity is 0.2%, and accuracy reach 1.02 μm; the measurement range of the system by using interference is from 0.01 μm to 1.9 μ m, the lowest sensitivity is 0.1%, and accuracy reach 0.2 μm. The design can satisfy demands of a wide range, low sensitivity, low accruacy in centering-edging stage, and small range, high sensitivity, high accruacy in assembling stage. The centering system can meet the design requirements, and can guide the production and assembly of lithographic projection lens.