• Frontiers of Optoelectronics
  • Vol. 9, Issue 4, 549 (2016)
Ming ZHOU1、*, Sheng ZHOU1, Gang CHEN1, Yaopeng LI1, and Dingquan LIU1、2
Author Affiliations
  • 1Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
  • 2School of Physical Science and Technology, ShanghaiTech University, Shanghai 200031, China
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    DOI: 10.1007/s12200-016-0574-7 Cite this Article
    Ming ZHOU, Sheng ZHOU, Gang CHEN, Yaopeng LI, Dingquan LIU. Optical performance of ultra-thin silver films under the attenuated total reflection mode[J]. Frontiers of Optoelectronics, 2016, 9(4): 549 Copy Citation Text show less

    Abstract

    Ultra-thin silver films were deposited by thermal evaporation, and the dielectric functions of samples were simulated using Drude-Lorentz oscillators. When s-polarized incident light from the BK7 glass into thin silver film at 45° angle using attenuated total reflection (ATR) mode, we experimental observed that the reflection reach a minimum of 1.87% at 520 nm for thickness of d~6.3 nm silver film, and it reach a minimum of 10.1% at 500 nm for thickness of d~4.1 nm. Moreover, we simulated the absorption changes with incident angles at 520 nm for both p-polarized (TM wave) and s-polarized (TE wave) light using transfer matrix theory, and calculated the electric field distributions. The absorption as a function of incident angles of TM wave and TE wave showed different characteristics under ATR mode, TE wave reached the maximum absorption around the critical angle θc~41.1°, while TM wave reached the minimum absorption.
    Ming ZHOU, Sheng ZHOU, Gang CHEN, Yaopeng LI, Dingquan LIU. Optical performance of ultra-thin silver films under the attenuated total reflection mode[J]. Frontiers of Optoelectronics, 2016, 9(4): 549
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