• Chinese Journal of Lasers
  • Vol. 47, Issue 7, 701016 (2020)
Lü Zunren1、2, Zhang Zhongkai1、2, Wang Hong1、2, Ding Yunyun1、2, Yang Xiaoguang1、2, Meng Lei1、2, Chai Hongyu1、2, and Yang Tao1、2、*
Author Affiliations
  • 1Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,Chinese Academy of Sciences, Beijing 100083, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences,Beijing 100049, China
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    DOI: 10.3788/CJL202047.0701016 Cite this Article Set citation alerts
    Lü Zunren, Zhang Zhongkai, Wang Hong, Ding Yunyun, Yang Xiaoguang, Meng Lei, Chai Hongyu, Yang Tao. Research Progress on 1.3 μm Semiconductor Quantum-Dot Lasers[J]. Chinese Journal of Lasers, 2020, 47(7): 701016 Copy Citation Text show less

    Abstract

    Owing to the strong three-dimensional quantum-confinement effect of semiconductor quantum dots (QDs), QD lasers exhibit superior performances with low threshold current, high modulation rate, high temperature stability, low linewidth enhancement factor, and high antireflection. They are expected to have important applications in high-speed optical communication, high-speed optical interconnection, and other fields. At the same time, a QD structure is insensitive to dislocations, making QD lasers powerful candidates for the efficient light sources that are urgently needed for silicon optical integration. First, we briefly review the research progress on 1.3-μm semiconductor QD lasers, and then focus on the excellent characteristics exhibited by GaAs-based QD lasers, including their threshold current density, temperature stability, modulation rate, and antireflection characteristics. We also introduce QD lasers grown directly on GaAs and Si (001) substrates.
    Lü Zunren, Zhang Zhongkai, Wang Hong, Ding Yunyun, Yang Xiaoguang, Meng Lei, Chai Hongyu, Yang Tao. Research Progress on 1.3 μm Semiconductor Quantum-Dot Lasers[J]. Chinese Journal of Lasers, 2020, 47(7): 701016
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