Structural and component analysis of boron carbide films prepared by magnetron sputtering

Jingtao ZHU; Yang LIU; Jianrong ZHOU; Xiaojuan ZHOU; Zhijia SUN; Mingqi CUI

doi:10.3969/j.issn.1005-5630.202303130055

Journals >Optical Instruments >Volume 46 >Issue 2 >Page 63 > Article

Optical Instruments
Vol. 46, Issue 2, 63 (2024)

Structural and component analysis of boron carbide films prepared by magnetron sputtering

Jingtao ZHU¹, Yang LIU^1、2, Jianrong ZHOU^2、3、*, Xiaojuan ZHOU^2、3, Zhijia SUN^2、3, and Mingqi CUI³

Author Affiliations

¹School of Physical and Engineering, Tongji University, Shanghai 200092, China

²Spallation Neutron Source Science Center, Dongguan 523803, China

³Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3969/j.issn.1005-5630.202303130055 Cite this Article

Jingtao ZHU, Yang LIU, Jianrong ZHOU, Xiaojuan ZHOU, Zhijia SUN, Mingqi CUI. Structural and component analysis of boron carbide films prepared by magnetron sputtering[J]. Optical Instruments, 2024, 46(2): 63 Copy Citation Text

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SAED diagram of the Ti/B4C multilayer sample

Fig. 1. SAED diagram of the Ti/B₄C multilayer sample

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TEM cross section of the Ti/B4C multilayer sample

Fig. 2. TEM cross section of the Ti/B₄C multilayer sample

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Fig. 3. ToF-SIMS depth profile curve of the Ti/B₄C multilayer sample

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Fig. 4. XPS test curve of the Ti/B₄C multilayer samples

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Fig. 5. Neutron detection efficiency test

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