• Acta Optica Sinica
  • Vol. 44, Issue 7, 0723002 (2024)
Le Tang1、2、4, Liangping Xia1、4、*, Man Zhang1, Weiguo Zhang3, Hao Sun2、**, Chunyan Wang2, Suihu Dang1, and Chunlei Du1、4
Author Affiliations
  • 1Key Laboratory of Micro Nano Optoelectronic Devices and Intelligent Perception Systems, Yangtze Normal University, Chongqing 408100, China
  • 2School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China
  • 3Research Center for Micro-Nano Manufacturing and System Integration, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China
  • 4Zhuhai Multiscale Optoelectronics Technology Co., Ltd, Zhuhai 519060, Guangdong , China
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    DOI: 10.3788/AOS231883 Cite this Article Set citation alerts
    Le Tang, Liangping Xia, Man Zhang, Weiguo Zhang, Hao Sun, Chunyan Wang, Suihu Dang, Chunlei Du. Method of Measuring Surface Error Peak to Valley of Micro Lens Based on Far-Field Light Distribution[J]. Acta Optica Sinica, 2024, 44(7): 0723002 Copy Citation Text show less
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    [1] Yan J B, Fang L, Sun Z H et al. Complete active-passive photonic integration based on GaN-on-silicon platform[J]. Advanced Photonics Nexus, 2, 046003(2023).

    [2] Yuan W, Xu C, Xue L et al. Integrated double-sided random microlens array used for laser beam homogenization[J]. Micromachines, 12, 673(2021).

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    [5] Modaresialam M, Chehadi Z, Bottein T et al. Nanoimprint lithography processing of inorganic-based materials[J]. Chemistry of Materials, 33, 5464-5482(2021).

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    [16] Zhu D Z, Xu L, Ding C L et al. Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography[J]. Advanced Photonics, 4, 066002(2022).

    Le Tang, Liangping Xia, Man Zhang, Weiguo Zhang, Hao Sun, Chunyan Wang, Suihu Dang, Chunlei Du. Method of Measuring Surface Error Peak to Valley of Micro Lens Based on Far-Field Light Distribution[J]. Acta Optica Sinica, 2024, 44(7): 0723002
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