• Semiconductor Optoelectronics
  • Vol. 42, Issue 4, 532 (2021)
GUO Chenpeng, LI Jingjing, LI Lihua, GU Yongjun, and HUANG Jinliang
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  • [in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2021.04.016 Cite this Article
    GUO Chenpeng, LI Jingjing, LI Lihua, GU Yongjun, HUANG Jinliang. Study on Photoelectric Catalysis Performance of WO3 Nanoplate Films with Exposed (002) Facets[J]. Semiconductor Optoelectronics, 2021, 42(4): 532 Copy Citation Text show less

    Abstract

    WO3 nanoplate films with highly active (002) facets were prepared on the FTO substrate with one-step hydrothermal method by using sodium tungstate dihydrate (Na2WO4·2H2O) as the raw material and oxalic acid (H2C2O4) as the structure-directing agent. The phase and morphology of the samples were characterized by XRD and FESEM. The energy band structure and carrier separation ability of the film were characterized by UV-Vis and PL. The photoelectric properties of WO3 nanoplate films were characterized by electrochemical workstation. The effects of oxalic acid dosages on the crystal orientation, morphology, size and photocatalytic performance of WO3 nanoplate films were investigated. The results show that the WO3 nanoplate films with 0.3g oxalic acid dosages present the highest diffraction peak on the (002) facets and possess the best photocatalytic performance.
    GUO Chenpeng, LI Jingjing, LI Lihua, GU Yongjun, HUANG Jinliang. Study on Photoelectric Catalysis Performance of WO3 Nanoplate Films with Exposed (002) Facets[J]. Semiconductor Optoelectronics, 2021, 42(4): 532
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