Fig. 1. Nodular defect morphology under laser irradiation
Fig. 2. Distribution of nodular defects in gratings
Fig. 3. Grating damage morphology and electric field distribution caused by nodular defects at different positions of s-polarized Ti:Sapphire laser with an incident angle of 65° and a pulse duration of 32 fs
[41] Fig. 4. Damage evolution of grating film under irradiation of 120 fs, 796 nm, 10 Hz laser
[40]. (a)(d) nano bumps; (b)(e) surface roughness; (c) nano cracks; (f) film falling off
Fig. 5. Distribution of grating films
Fig. 6. Grating damage morphologies of Ti: Sapphire laser with different laser injection energy and film deposition methods at a frequency of 1 kHz and a pulse duration of 60 fs
[50] Fig. 7. Damage morphology of ACG prepared by electron beam evaporation with Ti: Sapphire laser at frequency 1 kHz and pulse duration 60 fs
[51] Fig. 8. Changes of LIDT of SiO
2 sol-gel film with pollution time
[63] Fig. 9. Damage morphologies of MMDG with 1.48 J/cm
2 of particulate pollutants at pulse duration of 8.6 ps
[64] Fig. 10. Typical pulse compression grating preparation process
Fig. 11. Laser-induced damage thresholds of HfO
2 films at annealing temperatures of 353 K, 423 K, 503 K and 573 K
[65] Fig. 12. Elements content of the surface of the substrates
[69] Fig. 13. Damage state of Ti: Sapphire laser in the state of single-pulse and double-pulse radiation at a frequency of 10 Hz and a pulse duration of 35 fs
[70] Fig. 14. SEM images of grating before and after cleaning
[76] Fig. 15. Damage probability of introduced gas under vacuum and different pressures
[80] Fig. 16. Scientific and technical issues in the research on laser-induced damage of pulse-compressed gratings
influencing factor | damage forms | damage mechanism | nodular defect[37-40] | (1) under the grating column: the central grating column disappear, the adjacent two grating columns partially disappear
(2) under the grating groove: two adjacent grating columns disappear
| with the increase of electric field strength, the collision effect of free electrons is enhanced, which leads to avalanche ionization | laser injection energy and pulse number[41-42] | damage process: bump generation, more bumps, nano crack, film falling off | the bumps are formed by nodular defects, the electric field is enhanced, the free electron collision is intensified, the nano cracks are formed, and the film finally falls off | film deposition process[49-51] | (1) electron beam evaporation preparation: bubble formation, nano crack generation and propagation, and final film peeling off | the photoresist ionizes free electrons to cause bubbles; with the increase of electric field strength, the nano cracks and the film peeling off | (2) magnetron sputtering: melting of films and microstructures[49-51] | ionization of free electrons; as the radiation time increases, the number of free electrons increases, the collision intensifies, and the radiation energy absorption causes the gold film to melt | surface contamination[56-57] | organic contamination carbonization, surface microstructure damage | the contamination absorbs radiation energy and excites free electrons; with the increase of electric field strength, electron collision and avalanche ionization are intensified |
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Table 1. Comparison of influencing factors of laser-induced damage threshold
technological process | advantages | disadvantages | high temperature annealing[65-66] | the film performance is improved; significant LIDT increase | annealing temperature and time have great influence on the LIDT; the operation is complicated | ion beam etching[67-68] | remove of pollutants; reduction of defect density | potential damage to the surface | nanosecond laser pre-irradiation[70] | easy operation; on-line operation; removal of pollutants | heat accumulation on grating surface caused by long time pre-radiation | cleaning of PCG[72-74] | significant effect of threshold promotion; easy operation; plasma cleaning can be used to realize on-line cleaning | the pollutants produced in operation cannot be removed; chemical cleaning method is difficult to realize on-line cleaning | introduction of O2 and N2[80] | easy operation; good economy; on-line operation | introduction of impurity gas reduces the vacuum degree, resulting in laser dispersion |
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Table 2. Comparison of laser damage threshold enhancement process schemes