• High Power Laser and Particle Beams
  • Vol. 34, Issue 8, 081002 (2022)
Qingshun Bai*, Hao Sun, Yuhai Li, Peng Zhang, and Yunlong Du
Author Affiliations
  • School of Mechanical and Electrical Engineering, Harbin Institute of Technology, Harbin 150001, China
  • show less
    DOI: 10.11884/HPLPB202234.210413 Cite this Article
    Qingshun Bai, Hao Sun, Yuhai Li, Peng Zhang, Yunlong Du. Research progress on laser-induced damage mechanism and threshold improvement of pulse compression gratings[J]. High Power Laser and Particle Beams, 2022, 34(8): 081002 Copy Citation Text show less
    Nodular defect morphology under laser irradiation
    Fig. 1. Nodular defect morphology under laser irradiation
    Distribution of nodular defects in gratings
    Fig. 2. Distribution of nodular defects in gratings
    Grating damage morphology and electric field distribution caused by nodular defects at different positions of s-polarized Ti:Sapphire laser with an incident angle of 65° and a pulse duration of 32 fs[41]
    Fig. 3. Grating damage morphology and electric field distribution caused by nodular defects at different positions of s-polarized Ti:Sapphire laser with an incident angle of 65° and a pulse duration of 32 fs[41]
    Damage evolution of grating film under irradiation of 120 fs, 796 nm, 10 Hz laser[40]. (a)(d) nano bumps; (b)(e) surface roughness; (c) nano cracks; (f) film falling off
    Fig. 4. Damage evolution of grating film under irradiation of 120 fs, 796 nm, 10 Hz laser[40]. (a)(d) nano bumps; (b)(e) surface roughness; (c) nano cracks; (f) film falling off
    Distribution of grating films
    Fig. 5. Distribution of grating films
    Grating damage morphologies of Ti: Sapphire laser with different laser injection energy and film deposition methods at a frequency of 1 kHz and a pulse duration of 60 fs[50]
    Fig. 6. Grating damage morphologies of Ti: Sapphire laser with different laser injection energy and film deposition methods at a frequency of 1 kHz and a pulse duration of 60 fs[50]
    Damage morphology of ACG prepared by electron beam evaporation with Ti: Sapphire laser at frequency 1 kHz and pulse duration 60 fs[51]
    Fig. 7. Damage morphology of ACG prepared by electron beam evaporation with Ti: Sapphire laser at frequency 1 kHz and pulse duration 60 fs[51]
    Changes of LIDT of SiO2 sol-gel film with pollution time[63]
    Fig. 8. Changes of LIDT of SiO2 sol-gel film with pollution time[63]
    Damage morphologies of MMDG with 1.48 J/cm2 of particulate pollutants at pulse duration of 8.6 ps[64]
    Fig. 9. Damage morphologies of MMDG with 1.48 J/cm2 of particulate pollutants at pulse duration of 8.6 ps[64]
    Typical pulse compression grating preparation process
    Fig. 10. Typical pulse compression grating preparation process
    Laser-induced damage thresholds of HfO2 films at annealing temperatures of 353 K, 423 K, 503 K and 573 K[65]
    Fig. 11. Laser-induced damage thresholds of HfO2 films at annealing temperatures of 353 K, 423 K, 503 K and 573 K[65]
    Elements content of the surface of the substrates[69]
    Fig. 12. Elements content of the surface of the substrates[69]
    Damage state of Ti: Sapphire laser in the state of single-pulse and double-pulse radiation at a frequency of 10 Hz and a pulse duration of 35 fs[70]
    Fig. 13. Damage state of Ti: Sapphire laser in the state of single-pulse and double-pulse radiation at a frequency of 10 Hz and a pulse duration of 35 fs[70]
    SEM images of grating before and after cleaning[76]
    Fig. 14. SEM images of grating before and after cleaning[76]
    Damage probability of introduced gas under vacuum and different pressures[80]
    Fig. 15. Damage probability of introduced gas under vacuum and different pressures[80]
    Scientific and technical issues in the research on laser-induced damage of pulse-compressed gratings
    Fig. 16. Scientific and technical issues in the research on laser-induced damage of pulse-compressed gratings
    influencing factordamage formsdamage mechanism
    nodular defect[37-40](1) under the grating column: the central grating column disappear, the adjacent two grating columns partially disappear (2) under the grating groove: two adjacent grating columns disappear with the increase of electric field strength, the collision effect of free electrons is enhanced, which leads to avalanche ionization
    laser injection energy and pulse number[41-42]damage process: bump generation, more bumps, nano crack, film falling offthe bumps are formed by nodular defects, the electric field is enhanced, the free electron collision is intensified, the nano cracks are formed, and the film finally falls off
    film deposition process[49-51](1) electron beam evaporation preparation: bubble formation, nano crack generation and propagation, and final film peeling offthe photoresist ionizes free electrons to cause bubbles; with the increase of electric field strength, the nano cracks and the film peeling off
    (2) magnetron sputtering: melting of films and microstructures[49-51]ionization of free electrons; as the radiation time increases, the number of free electrons increases, the collision intensifies, and the radiation energy absorption causes the gold film to melt
    surface contamination[56-57]organic contamination carbonization, surface microstructure damagethe contamination absorbs radiation energy and excites free electrons; with the increase of electric field strength, electron collision and avalanche ionization are intensified
    Table 1. Comparison of influencing factors of laser-induced damage threshold
    technological processadvantagesdisadvantages
    high temperature annealing[65-66]the film performance is improved; significant LIDT increaseannealing temperature and time have great influence on the LIDT; the operation is complicated
    ion beam etching[67-68]remove of pollutants; reduction of defect densitypotential damage to the surface
    nanosecond laser pre-irradiation[70]easy operation; on-line operation; removal of pollutantsheat accumulation on grating surface caused by long time pre-radiation
    cleaning of PCG[72-74]significant effect of threshold promotion; easy operation; plasma cleaning can be used to realize on-line cleaningthe pollutants produced in operation cannot be removed; chemical cleaning method is difficult to realize on-line cleaning
    introduction of O2 and N2[80]easy operation; good economy; on-line operationintroduction of impurity gas reduces the vacuum degree, resulting in laser dispersion
    Table 2. Comparison of laser damage threshold enhancement process schemes
    Qingshun Bai, Hao Sun, Yuhai Li, Peng Zhang, Yunlong Du. Research progress on laser-induced damage mechanism and threshold improvement of pulse compression gratings[J]. High Power Laser and Particle Beams, 2022, 34(8): 081002
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