• Optoelectronic Technology
  • Vol. 43, Issue 1, 48 (2023)
Hui ZHAO
Author Affiliations
  • ——(Nanjing BOE Display Technology Co., Ltd., Nanjing 210033, CHN)
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    DOI: 10.19453/j.cnki.1005-488x.2023.01.008 Cite this Article
    Hui ZHAO. Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field‑effect Transistor[J]. Optoelectronic Technology, 2023, 43(1): 48 Copy Citation Text show less

    Abstract

    The etching mechanism of Cu/Ti etchant and the change of etchant concentration was experimentally analyzed. On the basis, the changing curve of etchant concentration was clearly checked by experimental results. The control method of Cu/Ti etchant concentration was also suggested. And then, the life time and stability of Cu/Ti etchant was obvious improved,providing some reference for the research and production of related field.
    Hui ZHAO. Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field‑effect Transistor[J]. Optoelectronic Technology, 2023, 43(1): 48
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