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    Journals >Chinese Journal of Lasers >Volume 17 >Issue s1 >Page 162 > Article
    • Chinese Journal of Lasers
    • Vol. 17, Issue s1, 162 (1990)
    Measurement of absorption distribution on optical thin film by scanning photothermal microscopy
    Huang Xuebo and Chen Wenbin
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    Huang Xuebo, Chen Wenbin. Measurement of absorption distribution on optical thin film by scanning photothermal microscopy[J]. Chinese Journal of Lasers, 1990, 17(s1): 162 Copy Citation Text show less

    Abstract

    A scanning photothermal microscopy based on photothermal deflection spectroscopy is used to measure the absorption distribution of laser damaged films. Its detecting sensitivity and detecting accuracy is 2.5×10-6 and 18% respectively.

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    Huang Xuebo, Chen Wenbin. Measurement of absorption distribution on optical thin film by scanning photothermal microscopy[J]. Chinese Journal of Lasers, 1990, 17(s1): 162
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    Paper Information
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