• Semiconductor Optoelectronics
  • Vol. 44, Issue 2, 228 (2023)
HUANG Kai1、2, GUO Chun1, and KONG Mingdong1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2021100601 Cite this Article
    HUANG Kai, GUO Chun, KONG Mingdong. Research on the Effect of Interface Roughness on Spectral Properties of VUV Optical Thin Film[J]. Semiconductor Optoelectronics, 2023, 44(2): 228 Copy Citation Text show less

    Abstract

    Antireflection film with a narrow range of angle of incidence (AOI), antireflection film with a wide range of AOI, and multilayer high reflection thin film at 193nm were designed respectively. The maximum deviations of the s and p polarized light transmittances of the antireflection film were 0.17% and 0.44%, respectively. Combining the scalar scattering theory and the equivalent absorption layer approximation theory, the rough interface between the multilayer film was equivalent to a thin absorption layer, and the spectral properties at different interface roughness were analyzed based on the thin film intrinsic transfer matrix. The results show that the spectral performance of the optical thin film decrease with the increase of the root mean square roughness of the interface and the reflection bandwidth of the high reflection film also decrease. When the root mean square roughness reaches 4nm, the spectral performance of the antireflection film with a wide range of AOI and the multilayer high reflection film degrade by 2.04% and 2.09%, respectively. Interface roughness is the key factor affecting the preparation of VUV optical thin film with high spectral properties.
    HUANG Kai, GUO Chun, KONG Mingdong. Research on the Effect of Interface Roughness on Spectral Properties of VUV Optical Thin Film[J]. Semiconductor Optoelectronics, 2023, 44(2): 228
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