Contents

About Journal of Advanced Dielectrics

 
  • Aims and Scope

    The Journal of Advanced Dielectrics (JAD) is an international peer-reviewed journal for original contributions on the understanding and applications of dielectrics in modern electronic devices and systems. The journal seeks to provide an interdisciplinary forum for the rapid communication of novel research of high quality in, but not limited to, the following topics:

     

    • Fundamentals of dielectrics (ab initio or first-principles calculations, density functional theory, phenomenological approaches).

    • Polarization and related phenomena (spontaneous polarization, domain structure, polarization reversal).

    • Dielectric relaxation (universal relaxation law, relaxor ferroelectrics, giant permittivity, flexoelectric effect).

    • Ferroelectric materials and devices (single crystals and ceramics).

    • Thin/thick films and devices (ferroelectric memory devices, capacitors).

    • Piezoelectric materials and applications (lead-based piezo-ceramics and crystals, lead-free piezoelectrics).

    • Pyroelectric materials and devices

    • Multiferroics (single phase multiferroics, composite ferromagnetic ferroelectric materials).

    • Electrooptic and photonic materials.

    • Energy harvesting and storage materials (polymer, composite, super-capacitor).

    • Phase transitions and structural characterizations.

    • Microwave and milimeterwave dielectrics.

    • Nanostructure, size effects and characterizations.

    • Engineering dielectrics for high voltage applications (insulation, electrical breakdown).

    • Modeling (microstructure evolution and microstructure-property relationships, multiscale modeling of dielectrics).

     

    JAD was sponsored by International Center for Dielectric Research (ICDR), Xi'an Jiaotong University, China.

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Editorial Board

 
  • Editor-in-Chief

    Xi Yao, Xi'an Jiaotong University, China

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  • Editors

    Yongxiang Li, Shanghai Institute of Ceramics, Chinese Academy of Sciences, China

    Cewen Nan, Tsinghua University, China

    Ahmad Safari, Rutgers University, USA

    Vladimir Ya. Shur, Ural Federal University, Russia

    Takaaki Tsurumi, Tokyo Institute of Technology, Japan

    Xiaoyong Wei, Xi'an Jiaotong University, China

    Zuo-Guang Ye, Simon Fraser University, Canada

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  • Board Members

    Miguel Algueró, Instituto de Ciencia de Materiales de Madrid (ICMM), Spain

    Jüras Banys, Vilnius University, Lithuania

    Aimé Peláiz Barranco, Universidad de La Habana, Cuba

    Nazanin Bassiri-Gharb, Georgia Institute of Technology, USA

    Alexei A. Bokov, Simon Fraser University, Canada

    David Cann, Oregon State University, USA

    Long-Qing Chen, The Pennsylvania State University, USA

    Zhongyang Cheng, Auburn University, USA

    Zhi-Min Dang, Tsinghua University, China

    Catherine Elissalde, Institute of Condensed Matter Chemistry of Bordeaux (ICMCB) - CNRS, France

    Hiroshi Funakubo, Tokyo Institute of Technology, Japan

    Norifumi Fujimura, Osaka Prefecture University, Japan

    Reimund Gerhard, University of Potsdam, Germany

    Xihong Hao, Inner Mongolia University of Science and Technology, China

    Jiri Hlinka, Institute of Physics, The Czech Academy of Sciences

    Li Jin, Xi'an Jiaotong University, China

    Andrei Kholkin, University of Aveiro, Portugal

    Eung Soo Kim, Kyonggi University, Korea

    Jae-Hyeon Ko, Hallym University, Korea

    Ling Bing Kong, Shenzhen Technology University, China

    Jurij Koruza, Technical University of Darmstadt, Germany

    Yoshihiro Kuroiwa, Hiroshima University, Japan

    Fei Li, Xi’an Jiaotong University, China

    Guo-Rong Li, Shanghai Institute of Ceramics, Chinese Academy of Sciences

    Jiangyu Li, Southern University of Science and Technology, China

    Yan-Rong Li, University of Electronics Science and Technology of China, China

    Hanxing Liu, Wuhan University of Technology, China

    Ming Liu, Xi'an Jiaotong University, China

    Yun Liu, The Australian National University, Australia

    Zhifu Liu, Shanghai Institute of Ceramics, Chinese Academy of Sciences

    Yuji Noguchi, The University of Tokyo, Japan

    Ivan A. Parinov, Southern Federal University, Russia

    Yimnirun Rattikorn, Suranaree University of Technology, Thailand

    Mike Reece, University of London, UK

    Krystian Roleder, University of Silesia in Katowice, Poland

    Wei Ren, Xi'an Jiaotong University, China

    Tadej Rojac, Jo?ef Stefan Institute, Slovenia

    Xiaoli Tan, Iowa State University, USA

    R. P. Tandon, University of Delhi, India

    Chunlei Wang, Shandong University, China

    Ke Wang, Tsinghua University, China

    Di Wu, Nanjing University, China

    Jiagang Wu, Sichuan University, China

    Yugong Wu, Tianjin University, China

    Kui Yao, Institute of Materials Research and Engineering, A

    STAR (Agency for Science, Technology and Research), Singapore

    Yumeng You, Southeast University, China

    Jiwei Zhai, Tongji University, China

    Haibo Zhang, Huazhong University of Science and Technology, China

    Shujun Zhang, University of Wollongong, Australia

    Di Zhou, Xi'an Jiaotong University, China

    Jianguo Zhu, Sichuan University, China

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  • Managing Editors

    Nan Zhang, Xi'an Jiaotong University, China

    Jihui Gong, Xi'an Jiaotong University, China

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  • Editorial Team

    Xiangyu Gao, Xi'an Jiaotong University, China

    Jingrui Li, Xi'an Jiaotong University, China

    Xingtian Yin, Xi'an Jiaotong University, China

    Jie Zhang, Xi'an Jiaotong University, China

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Contact Us

 
  • JAD Editorial Office

  • Electronic Materials Research Laboratory (EMRL)

  • Xi'an Jiaotong University, Xi'an 710049, P.R. China

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  • Email: jad@xjtu.edu.cn

  • Tel: +86-29-83395679

  • Fax: +86-29-83395679