• Chinese Optics Letters
  • Vol. 8, Issue s1, 105 (2010)
Dandan Liu1, Huasong Liu1、2, Yiqin Ji1、3, Fuhao Jiang4, and Deying Chen3
Author Affiliations
  • 1Tianjin Key Laboratory of Optical Thin Films, Tianjin Jinhang Institute of Technical Physics, Tianjin 300192, China
  • 2Institute of Precision Optical Engineering, Tongji University, Shanghai 200192, China
  • 3National Key laboratory of Tunable Laser, Institute of Optical-Electronics, Harbin Institute of Technology, Harbin 150001, China
  • 4Beijing Institute of Automation Control Equipment, Beijing 100074, China
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    DOI: 10.3788/COL201008s1.0105 Cite this Article Set citation alerts
    Dandan Liu, Huasong Liu, Yiqin Ji, Fuhao Jiang, Deying Chen. Analysis of the magnitude and distribution of low loss thin film[J]. Chinese Optics Letters, 2010, 8(s1): 105 Copy Citation Text show less

    Abstract

    Total loss test of the high-reflective (HR) film coated on super-smooth silica substrate by dual ion beam sputtering (DIBS) is based on the well-established cavity ring-down technique. Scattering and transmittance are tested by integral scattering and transmittance measuring apparatus, after which absorption is calculated. At 632.8 nm wavelength, the magnitude and distribution of thin film loss are researched for both s- and p-polarization, and the reflectivities are 0.99986, 0.99997, and 0.99962, respectively. Based on the analysis, the tested scattering is less than its real value.
    Dandan Liu, Huasong Liu, Yiqin Ji, Fuhao Jiang, Deying Chen. Analysis of the magnitude and distribution of low loss thin film[J]. Chinese Optics Letters, 2010, 8(s1): 105
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