• Frontiers of Optoelectronics
  • Vol. 13, Issue 2, 91 (2020)
Petri MUSTONEN*, David M. A. MACKENZIE, and Harri LIPSANEN
Author Affiliations
  • Department of Electronics and Nanoengineering, Aalto University, Aalto FI-00076, Finland
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    DOI: 10.1007/s12200-020-1011-5 Cite this Article
    Petri MUSTONEN, David M. A. MACKENZIE, Harri LIPSANEN. Review of fabrication methods of large-area transparent graphene electrodes for industry[J]. Frontiers of Optoelectronics, 2020, 13(2): 91 Copy Citation Text show less

    Abstract

    Graphene is a two-dimensional material showing excellent properties for utilization in transparent electrodes; it has low sheet resistance, high optical transmission and is flexible. Whereas the most common transparent electrode material, tin-doped indium-oxide (ITO) is brittle, less transparent and expensive, which limit its compatibility in flexible electronics as well as in low-cost devices. Here we review two large-area fabrication methods for graphene based transparent electrodes for industry: liquid exfoliation and low-pressure chemical vapor deposition (CVD). We discuss the basic methodologies behind the technologies with an emphasis on optical and electrical properties of recent results. State-of-the-art methods for liquid exfoliation have as a figure of merit an electrical and optical conductivity ratio of 43:5, slightly over the minimum required for industry of 35, while CVD reaches as high as 419.
    Petri MUSTONEN, David M. A. MACKENZIE, Harri LIPSANEN. Review of fabrication methods of large-area transparent graphene electrodes for industry[J]. Frontiers of Optoelectronics, 2020, 13(2): 91
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