• Infrared and Laser Engineering
  • Vol. 45, Issue 1, 120002 (2016)
Hu Neibin1、*, Bai Jian1, Mo Honglei2, Zhu Beibei2, Lan Jie2, and Liang Yiyong1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/irla201645.0120002 Cite this Article
    Hu Neibin, Bai Jian, Mo Honglei, Zhu Beibei, Lan Jie, Liang Yiyong. Laser direct writing technology for printing mesh on convex surface[J]. Infrared and Laser Engineering, 2016, 45(1): 120002 Copy Citation Text show less

    Abstract

    In order to meet the requirement of convex surface mask in concave surface lithography, convex surface laser direct writing system was set up to fabricate the mask. This apparatus supported up to ±20° tilt angle. With the exposure correction algorithm in the process, the system accomplished writing rectangular grid pattern on a spherical substrate with 50 mm caliber and 51.64 mm radius. It was able to draw circular ring pattern on the surface by result of simultaneous motion of two tilting tables. The experiment shows that this setup has the capacity to fabricate the convex mesh lithographic mask and lay a solid base for convex surface lithography technology.
    Hu Neibin, Bai Jian, Mo Honglei, Zhu Beibei, Lan Jie, Liang Yiyong. Laser direct writing technology for printing mesh on convex surface[J]. Infrared and Laser Engineering, 2016, 45(1): 120002
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