Analysis of TiO2 for microelectronic applications: effect of deposition methods on their electrical properties

Davinder RATHEE; Sandeep K ARYA; Mukesh KUMAR

doi:10.1007/s12200-011-0188-z

Journals >Frontiers of Optoelectronics >Volume 4 >Issue 4 >Page 349 > Article

Frontiers of Optoelectronics
Vol. 4, Issue 4, 349 (2011)

Analysis of TiO₂ for microelectronic applications: effect of deposition methods on their electrical properties

Davinder RATHEE^1、*, Sandeep K ARYA¹, and Mukesh KUMAR²

Author Affiliations

¹Department of Electronics and Communication Engineering, Guru Jambheshwar University of Science & Technology, Hisar, India

²Department of Electronics Science, Kurukshetra University, Kurukshetra, India

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DOI: 10.1007/s12200-011-0188-z Cite this Article

Davinder RATHEE, Sandeep K ARYA, Mukesh KUMAR. Analysis of TiO₂ for microelectronic applications: effect of deposition methods on their electrical properties[J]. Frontiers of Optoelectronics, 2011, 4(4): 349 Copy Citation Text

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