Contents
2020
Volume: 2 Issue 3
9 Article(s)

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Editorial
Atomic and close-to-atomic scale manufacturing: perspectives and measures
Fang Fengzhou
This article presents the three paradigms of manufacturing advancement: Manufacturing I, craft-based manufacturing by hand, as in the Stone, Bronze, and Iron Ages, in which manufacturing precision was at the millimeter scale; Manufacturing II, precision-controllable manufacturing using machinery whereby the scales of m
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 30201 (2020)
Paper
Scanning probe lithography on calixarene towards single-digit nanometer fabrication
Kaestner Marcus, and Rangelow Ivo W
Cost effective patterning based on scanning probe nanolithography (SPL) has the potential for electronic and optical nano-device manufacturing and other nanotechnological applications. One of the fundamental advantages of SPL is its capability for patterning and imaging employing the same probe. This is achieved with s
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 32005 (2020)
Cooling rate calibration and mapping of ultra-short pulsed laser modifications in fused silica by Raman and Brillouin spectroscopy
Bergler Michael, Cvecek Kristian, Werr Ferdinand, Brehl Martin, Ligny Dominique De, and Schmidt Michael
This paper focuses on the preparation of a new extended set of calibrations of cooling rate (fictive temperature) in fused silica determined by inelastic light scattering and its subsequent use to characterize the local cooling rate distribution in ultra-short pulsed (USP) laser modification. In order to determine the
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 35001 (2020)
Implications of using two low-power continuous-wave lasers for polishing
Zhang Wenxuan, Wong Kiwan, Morales Miguel, Molpeceres Carlos, and Arnold Craig B
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 35101 (2020)
Topical Review
High-efficiency forming processes for complex thin-walled titanium alloys components: state-of-the-art and perspectives
Wang Kehuan, Wang Liliang, Zheng Kailun, He Zhubin, Politis Denis J, Liu Gang, and Yuan Shijian
Complex thin-walled titanium alloy components play a key role in the aircraft, aerospace and marine industries, offering the advantages of reduced weight and increased thermal resistance. The geometrical complexity, dimensional accuracy and in-service properties are essential to fulfill the high-performance standards r
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 32001 (2020)
Bioinspired micro/nanostructured surfaces prepared by femtosecond laser direct writing for multi-functional applications
Zhang Yiyuan, Jiao Yunlong, Li Chuanzong, Chen Chao, Li Jiawen, Hu Yanlei, Wu Dong, and Chu Jiaru
Femtosecond laser direct writing (FLDW) has been widely employed in controllable manufacturing of biomimetic micro/nanostructures due to its specific advantages including high precision, simplicity, and compatibility for diverse materials in comparison with other methods (e.g. ion etching, sol-gel process, chemical vap
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 32002 (2020)
A review on microstructures and properties of high entropy alloys manufactured by selective laser melting
Zhang Chen, Zhu Junkai, Zheng Huai, Li Hui, Liu Sheng, and Cheng Gary J
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 32003 (2020)
Thermal behavior of materials in laser-assisted extreme manufacturing: Raman-based novel characterization
Wang Ridong, Xu Shen, Yue Yanan, and Wang Xinwei
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 32004 (2020)
Directed self-assembly of block copolymers for sub-10 nm fabrication
Chen Yu, and Xiong Shisheng
Directed self-assembly (DSA) emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography. DSA achieves high-resolution patterning by molecular assembly that circumvents the diffraction limit of conventional photolithography. Recently, the International
International Journal of Extreme Manufacturing
  • Publication Date: Jan. 01, 1900
  • Vol.2 Issue, 3 32006 (2020)