• PhotoniX
  • Vol. 1, Issue 1, 18 (2020)
Yimin Yu1、†,*, Nabila Baba-Ali2, and Gregg M. Gallatin2
Author Affiliations
  • 1Shanghai Micro Electronics Equipment (Group) Co., Ltd., 1525 Zhangdong Road, Shanghai 201203, China
  • 2Stamford, Connecticut, USA
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    DOI: 10.1186/s43074-020-00018-6 Cite this Article
    Yimin Yu, Nabila Baba-Ali, Gregg M. Gallatin. Tolerance analysis of non-depolarizing double-pass polarimetry[J]. PhotoniX, 2020, 1(1): 18 Copy Citation Text show less

    Abstract

    Double-pass polarimetry measures the polarization properties of a sample over a range of polar angles and all azimuths. Here, we present a tolerance analysis of all the optical elements in both the calibration and measurement procedures to predict the sensitivities of the double-pass polarimeter. The calibration procedure is described by a Mueller matrix based on the eigenvalue calibration method (ECM) [1]. Our numerical results from the calibration and measurement in the Mueller matrix description with tolerances limited by systematic and stochastic noise from specifications of commercially available hardware components are in good agreement with previous experimental observations. Furthermore, by using the orientation Zernike polynomials (OZP) which are an extension of the Jones matrix formalism, similar to the Zernike polynomials wavefront expansion, the pupil distribution of the polarization properties of non-depolarizing samples under test are expanded. Using polar angles ranging up to 25∘, we predict a sensitivity of 0.5% for diattenuation and 0.3∘ for retardance using the root mean square (RMS) of the corresponding OZP coefficients as a measure of the error. This numerical tool provides an approach for further improving the sensitivities of polarimeters via error budgeting and replacing sensitive components with those having better precision.
    Yimin Yu, Nabila Baba-Ali, Gregg M. Gallatin. Tolerance analysis of non-depolarizing double-pass polarimetry[J]. PhotoniX, 2020, 1(1): 18
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